Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

Share and share alike! Our mothers always said it was the right thing to do, and it seems that this ideology is now coming front and center for double patterning at 20nm and below. As we continue to ...

The big joke about extreme ultraviolet (EUV) technology is that it takes seven trucks to deliver the mammoth tools compared to one for other advanced lithography tools — but actually, this is no joke.

People are always asking “What should I expect when I start designing at 20nm using double patterning?” It’s a good question, but in many real aspects, the answer is “It depends,” and that is not very ...

BELMONT, Calif.--(BUSINESS WIRE)--Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the ...

Applied Materials, Inc. (AMAT), a semiconductor equipment manufacturer (“semi cap”), announced Centura Sculpta last week. According to the company, this tool will help semiconductor manufacturers ...

Scanner resolution improvements have diminished since the 193-nm wavelength became commonplace. Today’s technologies are sufficient for 28-nm IC designs using immersion, but not beyond without ...