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电子工程专辑
7 年
EUV微影和Overlay控制详解
减少overlay误差对于提高产量和可靠性,并且确保组件符合性能规格而言非常重要,本文将针对向EUVL转型概述一些相关的可预见的overlay挑战。 Overlay是IC制造中的关键参数之,其意义是当层与前层图案(pattern)间对准的精准度(图1)。 各层组件之间的电路链接,例如 ...
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