Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

In this note, we extend the algorithms Extra [13] and subgradient-push [10] to a new algorithm ExtraPush for consensus optimization with convex differentiable objective functions over a directed ...

In this paper, we consider two different formulations (one is smooth and the other one is nonsmooth) for solving linear matrix inequalities (LMIs), an important class of semidefinite programming (SDP) ...

FAYETTEVILLE, GA, UNITED STATES, December 31, 2025 /EINPresswire.com/ — Artificial intelligence (AI) is increasingly transforming computational mechanics, yet many AI-driven models remain limited by ...