EUV-Lithografie: ASML beschießt Zinntropfen künftig 300.000-mal pro Sekunde
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EUV-Lithografie: ASML beschießt Zinntropfen künftig 300.000-mal pro Sekunde
Belichtungssysteme von ASML sollen 2030 rund 50 Prozent mehr Wafer belichten können als bisher. Das erfordert komplexe Technik.
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